Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7951524 | Self-topcoating photoresist for photolithography | Robert David Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders +4 more | 2011-05-31 |
| 7875408 | Bleachable materials for lithography | John A. Hoffnagle, David R. Medeiros, Robert D. Miller, Libor Vycklicky | 2011-01-25 |