KW

Kenji Wada

FU Fujifilm: 6 patents #35 of 996Top 4%
SE Seiko Epson: 1 patents #672 of 1,442Top 50%
Overall (2011): #8,123 of 364,097Top 3%
7
Patents 2011

Issued Patents 2011

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
8053161 Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition Hiroshi Saegusa 2011-11-08
8034547 Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method Hideaki Tsubaki, Shinji Tarutani, Kazuyoshi Mizutani, Wataru HOSHINO 2011-10-11
8017304 Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method Shinji Tarutani, Hideaki Tsubaki, Kazuyoshi Mizutani, Wataru HOSHINO 2011-09-13
7923199 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition 2011-04-12
7914965 Resist composition and method of pattern formation with the same Hyou Takahashi 2011-03-29
7879633 Miniature optical element for wireless bonding in an electronic instrument 2011-02-01
7875746 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition 2011-01-25