Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8080361 | Positive photosensitive composition and method of forming pattern using the same | Naoya Sugimoto, Kunihiko Kodama, Kei Yamamoto | 2011-12-20 |
| 7914965 | Resist composition and method of pattern formation with the same | Kenji Wada | 2011-03-29 |