Issued Patents 2011
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8080361 | Positive photosensitive composition and method of forming pattern using the same | Hyou Takahashi, Naoya Sugimoto, Kei Yamamoto | 2011-12-20 |
| 8039200 | Photosensitive composition and pattern-forming method using the photosensitive composition | — | 2011-10-18 |
| 8025833 | Curable composition for nanoimprint, and patterning method | Akinori Fujita, Tadashi OOMATSU, Akiyoshi GOTO | 2011-09-27 |
| 8012665 | Positive photosensitive composition and pattern forming method using the same | Fumiyuki Nishiyama | 2011-09-06 |
| 8003294 | Photosensitive composition, compound used for photosensitive composition and pattern-forming method using photosensitive composition | — | 2011-08-23 |
| 7960087 | Positive photosensitive composition and pattern-forming method using the same | — | 2011-06-14 |
| 7887988 | Positive resist composition and pattern forming method using the same | Kazuyoshi Mizutani, Kaoru Iwato, Masaomi Makino | 2011-02-15 |
| 7867697 | Positive photosensitive composition and method of forming resist pattern | — | 2011-01-11 |