Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7999325 | Method to remove spacer after salicidation to enhance contact etch stop liner stress on MOS | Yong Meng Lee, Chung Woh Lai, Wenhe Lin, Khee Yong Lim, Wee Leng Tan +3 more | 2011-08-16 |
| 7993997 | Poly profile engineering to modulate spacer induced stress for device enhancement | Vincent Ho, Wenhe Lin, Yong Kong Siew, Bei Chao Zhang, Fan Zhang +2 more | 2011-08-09 |
| 7977185 | Method and apparatus for post silicide spacer removal | Brian J. Greene, Chung Woh Lai, Yong Meng Lee, Wenhe Lin, Siddhartha Panda +1 more | 2011-07-12 |
| 7883953 | Method for transistor fabrication with optimized performance | Da Zhang, Voon-Yew Thean, Christopher V. Baiocco, Jie Chen, Weipeng Li +1 more | 2011-02-08 |
| 7867835 | Integrated circuit system for suppressing short channel effects | Jae Gon Lee, Elgin Quek, Wenzhi Gao | 2011-01-11 |