Issued Patents 2011
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8054446 | EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surface | Dieter Kraus, Stefan Schmidt | 2011-11-08 |
| 7959310 | Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element | Annemieke Van De Runstraat, Bastiaan Theodoor Wolschrijn, Arnoldus Jan Storm, Thomas Stein, Marco G. H. Meijerink +8 more | 2011-06-14 |
| 7911598 | Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device | Dieter Kraus, Thomas Stein, Harald Woelfle, Stefan Schmidt | 2011-03-22 |