Issued Patents 2011
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7911598 | Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device | Dieter Kraus, Dirk Heinrich Ehm, Thomas Stein, Stefan Schmidt | 2011-03-22 |