PT

Patricius Aloysius Jacobus Tinnemans

AB Asml Netherlands B.V.: 7 patents #15 of 377Top 4%
AN Asml Holding N.V.: 1 patents #20 of 68Top 30%
📍 Hapert, NL: #1 of 4 inventorsTop 25%
Overall (2011): #7,656 of 364,097Top 3%
7
Patents 2011

Issued Patents 2011

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
8049865 Lithographic system, device manufacturing method, and mask optimization method Wouter Frans Willem Mulckhuyse 2011-11-01
8009270 Uniform background radiation in maskless lithography Paul Antoon Cyriel Desmedt, Minne Cuperus 2011-08-30
8004652 Lithographic apparatus and device manufacturing method Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net +4 more 2011-08-23
7965373 Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load Martinus Hendricus Hoeks 2011-06-21
7936445 Altering pattern data based on measured optical element characteristics Jason Hintersteiner, Wenceslao A. Cebuhar 2011-05-03
7868998 Lithographic apparatus Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko +4 more 2011-01-11
7864295 Lithographic apparatus and device manufacturing method utilizing data filtering Johannes Jacobus Matheus Baselmans 2011-01-04