Issued Patents 2011
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8077291 | Substrate placement in immersion lithography | Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Petrus Anton Willem Cornelia Maria Van Eijck | 2011-12-13 |
| 8059266 | Radiometric Kirk test | David A. Hult, Heine Melle Mulder | 2011-11-15 |
| 8009269 | Optimal rasterization for maskless lithography | Kars Zeger Troost, Jason Hintersteiner, Kamen Hristov Chilov, Richard Carl Zimmerman, Ronnie Florentius Van T Westeinde | 2011-08-30 |
| 8009270 | Uniform background radiation in maskless lithography | Paul Antoon Cyriel Desmedt, Patricius Aloysius Jacobus Tinnemans | 2011-08-30 |