Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6964839 | Photosensitive polymer having cyclic backbone and resist composition containing the same | Sang-jun Choi, Hyun-Woo Kim, Joo-tae Moon | 2005-11-15 |
| 6962768 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | Hyun-Woo Kim | 2005-11-08 |
| 6844134 | Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same | Sang-jun Choi, Joo-tae Moon, Kwang-Sub Yoon, Ki Yong Song | 2005-01-18 |