Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6933096 | Photosensitive polymer including fluorine, resist composition containing the same and patterning method using the resist composition | Kwang-Sub Yoon | 2005-08-23 |
| 6844134 | Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same | Sang-jun Choi, Joo-tae Moon, Sang-Gyun Woo, Kwang-Sub Yoon | 2005-01-18 |