Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6964839 | Photosensitive polymer having cyclic backbone and resist composition containing the same | Sang-jun Choi, Hyun-Woo Kim, Sang-Gyun Woo | 2005-11-15 |
| 6844134 | Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same | Sang-jun Choi, Sang-Gyun Woo, Kwang-Sub Yoon, Ki Yong Song | 2005-01-18 |