Issued Patents 2005
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6965114 | Apparatus and methods for mask/substrate alignment in charged-particle-beam pattern-transfer | — | 2005-11-15 |
| 6936831 | Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same | Tomoharu Fujiwara, Kazuaki Suzuki, Teruaki Okino | 2005-08-30 |
| 6909490 | Reticle chambers and reticle cassettes providing temperature control and ready exchange of reticles for exposure | — | 2005-06-21 |
| 6841402 | Alignment-mark detection methods and devices for charged-particle-beam microlithography, and microelectronic-device manufacturing methods comprising same | — | 2005-01-11 |