Issued Patents 2005
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6953515 | Apparatus and method for providing a signal port in a polishing pad for optical endpoint detection | John M. Boyd | 2005-10-11 |
| 6945856 | Subaperture chemical mechanical planarization with polishing pad conditioning | John M. Boyd, David G. Halley | 2005-09-20 |
| 6936133 | Method and apparatus for fixed abrasive substrate preparation and use in a cluster CMP tool | John M. Boyd | 2005-08-30 |
| 6884156 | Multi-layer polishing pad material for CMP | Abaneshwar Prasad, Roland Sevilla | 2005-04-26 |
| 6875091 | Method and apparatus for conditioning a polishing pad with sonic energy | Allan M. Radman, Alan J. Jensen, Helmuth Treichel, Robert G. Boehm, Jr., Eric A. Dunton | 2005-04-05 |