Issued Patents 2005
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6841441 | Method to produce dual gates (one metal and one poly or metal silicide) for CMOS devices using sputtered metal deposition, metallic ion implantation, or silicon implantation, and laser annealing | Eng Hua Lim, Randall Cher Liang Cha, Jia Zhen Zheng, Elgin Quek, Mei Sheng Zhou +1 more | 2005-01-11 |