Issued Patents 2004
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6800566 | Adjustment of N and K values in a DARC film | Zhi-Cherng Lu, Chang-Jian Weng | 2004-10-05 |
| 6780788 | Methods for improving within-wafer uniformity of gate oxide | Ming-Fang Wang, Shih-Chang Chen | 2004-08-24 |
| 6767274 | Method to reduce defect/slurry residue for copper CMP | Weng Chang, Shih-Chang Chen | 2004-07-27 |
| 6737362 | Method for manufacturing a thin gate dielectric layer for integrated circuit fabrication | Chia-Lin Chen, Chun-Lin Wu, Tze-Liang Lee, Shih-Chang Chen | 2004-05-18 |
| 6727134 | Method of forming a nitride gate dielectric layer for advanced CMOS devices | Tze-Liang Lee, Shih-Chang Chen | 2004-04-27 |
| 6706581 | Dual gate dielectric scheme: SiON for high performance devices and high k for low power devices | Tou-Hung Hou, Ming-Fang Wang, Chih-Wei Yang, Liang-Gi Yao, Shih-Chang Chen | 2004-03-16 |