Issued Patents 2004
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6831794 | Objective with at least one aspheric lens | Frank Schillke, Franz-Josef Stickel, Alexander Epple | 2004-12-14 |
| 6825913 | Reticle with crystal support material and pellicle | Christian Wagner | 2004-11-30 |
| 6806942 | Projection exposure system | Wilhelm Ulrich, Toralf Gruner, Daniel Kraehmer, Wolfgang Singer, Alexander Epple +2 more | 2004-10-19 |
| 6801364 | Projection objective for microlithography | — | 2004-10-05 |
| 6788387 | Lithographic objective having a first lens group including only lenses having a positive refractive power | Alexander Epple | 2004-09-07 |
| 6781668 | Optical arrangement | Hubert Holderer, Rudolf Von Bünau, Christian Wagner, Jochen Becker, Stefan Xalter +1 more | 2004-08-24 |
| 6717722 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Helmut Beierl, Gerhard Furter, Wilhelm Ulrich | 2004-04-06 |
| 6683729 | Objective with crystal lenses and projection exposure equipment for microlithography | — | 2004-01-27 |