Issued Patents 2004
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6797572 | Method for forming a field effect transistor having a high-k gate dielectric and related structure | Huicai Zhong | 2004-09-28 |
| 6790755 | Preparation of stack high-K gate dielectrics with nitrided layer | — | 2004-09-14 |
| 6764898 | Implantation into high-K dielectric material after gate etch to facilitate removal | William G. En, Minh Van Ngo, Ming-Ren Lin | 2004-07-20 |
| 6762454 | Stacked polysilicon layer for boron penetration inhibition | Effiong Ibok, Arvind Halliyal, Minh Van Ngo | 2004-07-13 |
| 6759346 | Method of forming dielectric layers | — | 2004-07-06 |
| 6693004 | Interfacial barrier layer in semiconductor devices with high-K gate dielectric material | Arvind Halliyal, Minh Van Ngo, William G. En, Effiong Ibok | 2004-02-17 |