WC

Weng Chang

TSMC: 2 patents #109 of 754Top 15%
📍 Hsinchu, NJ: #4 of 14 inventorsTop 30%
Overall (2003): #37,228 of 273,478Top 15%
2
Patents 2003

Issued Patents 2003

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6576551 Chemical mechanical polish planarizing method with pressure compensating layer Chung-Shi Liu 2003-06-10
6518183 Hillock inhibiting method for forming a passivated copper containing conductor layer Tien-I Bao, Ying-Ho Chen, Syun-Ming Jang 2003-02-11