Issued Patents 2003
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6664031 | Process for forming photoresist pattern by using gas phase amine treatment | Jae Chang Jung, Cha-Won Koh, Jin-Soo Kim, Sung-Eun Hong, Ki Ho Baik | 2003-12-16 |
| 6593446 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Jae Chang Jung, Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2003-07-15 |
| 6514665 | Additives for improving post exposure delay stability of photoresist | Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2003-02-04 |