Issued Patents 2003
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6664031 | Process for forming photoresist pattern by using gas phase amine treatment | Jae Chang Jung, Jin-Soo Kim, Sung-Eun Hong, Keun Kyu Kong, Ki Ho Baik | 2003-12-16 |
| 6630281 | Photoresist composition for top-surface imaging processes by silylation | Geun Su Lee, Ki Ho Baik | 2003-10-07 |
| 6627378 | Photoresist composition for top-surface imaging process by silylation | — | 2003-09-30 |
| 6610616 | Method for forming micro-pattern of semiconductor device | Sung-Eun Hong, Min Ho Jung, Jin-Soo Kim, Geun Su Lee, Jae Chang Jung | 2003-08-26 |
| 6599844 | Method and forming fine patterns of semiconductor devices using passivation layers | Cheol Kyu Bok | 2003-07-29 |
| 6586619 | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2003-07-01 |