Issued Patents 2003
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6664031 | Process for forming photoresist pattern by using gas phase amine treatment | Jae Chang Jung, Cha-Won Koh, Jin-Soo Kim, Sung-Eun Hong, Keun Kyu Kong | 2003-12-16 |
| 6632903 | Polymer-containing photoresist, and process for manufacturing the same | Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok | 2003-10-14 |
| 6630281 | Photoresist composition for top-surface imaging processes by silylation | Cha-Won Koh, Geun Su Lee | 2003-10-07 |
| 6627383 | Photoresist monomer comprising bisphenol derivatives and polymers thereof | Geun Su Lee, Jae Chang Jung, Min Ho Jung | 2003-09-30 |
| 6627379 | Photoresist composition for resist flow process, and process for forming contact hole using the same | Jin-Soo Kim, Jae Chang Jung, Geun Su Lee | 2003-09-30 |
| 6608158 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok | 2003-08-19 |
| 6602650 | Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2003-08-05 |
| 6599678 | Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof | Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2003-07-29 |
| 6593446 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Jae Chang Jung, Keun Kyu Kong, Min Ho Jung, Sung-Eun Hong, Geun Su Lee | 2003-07-15 |
| 6589707 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Jae Chang Jung, Min Ho Jung | 2003-07-08 |
| 6586619 | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Min Ho Jung | 2003-07-01 |
| 6582883 | Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2003-06-24 |
| 6573012 | Photoresist monomers, polymers thereof and photoresist compositions using the same | Geun Su Lee, Jae Chang Jung | 2003-06-03 |
| 6569599 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Jae Chang Jung, Min Ho Jung | 2003-05-27 |
| 6562925 | Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2003-05-13 |
| 6548613 | Organic anti-reflective coating polymer and preparation thereof | Min Ho Jung, Sung-Eun Hong, Jae Chang Jung, Geun Su Lee | 2003-04-15 |
| 6538090 | Organic anti-reflective polymer and method for manufacturing thereof | Min Ho Jung, Sung-Eun Hong | 2003-03-25 |
| 6537724 | Photoresist composition for resist flow process, and process for forming contact hole using the same | Geun Su Lee, Jin-Soo Kim, Hyeong Soo Kim | 2003-03-25 |
| 6531562 | Photoresist monomer, polymer thereof and photoresist composition containing it | Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2003-03-11 |
| 6514665 | Additives for improving post exposure delay stability of photoresist | Jae Chang Jung, Keun Kyu Kong, Geun Su Lee | 2003-02-04 |