Issued Patents 2003
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6664031 | Process for forming photoresist pattern by using gas phase amine treatment | Cha-Won Koh, Jin-Soo Kim, Sung-Eun Hong, Keun Kyu Kong, Ki Ho Baik | 2003-12-16 |
| 6653047 | Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same | Geun Su Lee, Ki Soo Shin | 2003-11-25 |
| 6632903 | Polymer-containing photoresist, and process for manufacturing the same | Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2003-10-14 |
| 6627379 | Photoresist composition for resist flow process, and process for forming contact hole using the same | Jin-Soo Kim, Geun Su Lee, Ki Ho Baik | 2003-09-30 |
| 6627384 | Photoresist composition for resist flow process and process for forming a contact hole using the same | Hyeong Soo Kim | 2003-09-30 |
| 6627383 | Photoresist monomer comprising bisphenol derivatives and polymers thereof | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2003-09-30 |
| 6613493 | Photoresist polymer and composition having nitro groups | Geun Su Lee, Ki Soo Shin | 2003-09-02 |
| 6610616 | Method for forming micro-pattern of semiconductor device | Cha-Won Koh, Sung-Eun Hong, Min Ho Jung, Jin-Soo Kim, Geun Su Lee | 2003-08-26 |
| 6608158 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2003-08-19 |
| 6602650 | Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2003-08-05 |
| 6599678 | Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof | Sung-Eun Hong, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2003-07-29 |
| 6593446 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Keun Kyu Kong, Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2003-07-15 |
| 6589707 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2003-07-08 |
| 6586619 | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | Geun Su Lee, Cha-Won Koh, Min Ho Jung, Ki Ho Baik | 2003-07-01 |
| 6582883 | Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2003-06-24 |
| 6573012 | Photoresist monomers, polymers thereof and photoresist compositions using the same | Geun Su Lee, Ki Ho Baik | 2003-06-03 |
| 6569599 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2003-05-27 |
| 6569971 | Polymers for photoresist and photoresist compositions using the same | Chi Hyeong Roh | 2003-05-27 |
| 6562925 | Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2003-05-13 |
| 6548613 | Organic anti-reflective coating polymer and preparation thereof | Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2003-04-15 |
| 6531562 | Photoresist monomer, polymer thereof and photoresist composition containing it | Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2003-03-11 |
| 6514665 | Additives for improving post exposure delay stability of photoresist | Keun Kyu Kong, Geun Su Lee, Ki Ho Baik | 2003-02-04 |