Issued Patents 2003
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6656860 | Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus | Akiko Yoshida, Norio Komine | 2003-12-02 |
| 6649268 | Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member | Norio Komine, Seishi Fujiwara, Akiko Yoshida, Norihisa Yamaguchi | 2003-11-18 |
| 6587181 | Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus | Seishi Fujiwara | 2003-07-01 |
| 6587262 | UV synthetic silica glass optical member and reduction projection exposure apparatus using the same | Seishi Fujiwara, Norio Komine | 2003-07-01 |
| 6518210 | Exposure apparatus including silica glass and method for producing silica glass | Norio Komine, Hiroyuki Hiraiwa | 2003-02-11 |
| 6505484 | Forming method of silica glass and forming apparatus thereof | Seishi Fujiwara, Norio Komine | 2003-01-14 |