Issued Patents 2003
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6605396 | Resolution enhancement for alternating phase shift masks | Uwe Schroeder, Veit Klee | 2003-08-12 |
| 6579650 | Method and apparatus for determining photoresist pattern linearity | Paul Schroeder | 2003-06-17 |
| 6566227 | Strap resistance using selective oxidation to cap DT poly before STI etch | Paul Wensley, Martin Commons, Veit Klee | 2003-05-20 |
| 6551874 | Self-aligned STI process using nitride hard mask | John Pohl, Nirmal Chaudhary, Veit Klee, Paul Schroeder | 2003-04-22 |