Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6566227 | Strap resistance using selective oxidation to cap DT poly before STI etch | Martin Commons, Tobias Mono, Veit Klee | 2003-05-20 |
| 6518151 | Dual layer hard mask for eDRAM gate etch process | David M. Dobuzinsky, Babar A. Khan, Joyce C. Liu, Chienfan Yu | 2003-02-11 |