Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6579650 | Method and apparatus for determining photoresist pattern linearity | Tobias Mono | 2003-06-17 |
| 6551874 | Self-aligned STI process using nitride hard mask | John Pohl, Nirmal Chaudhary, Veit Klee, Tobias Mono | 2003-04-22 |