Issued Patents 2002
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500300 | Plasma reactor | — | 2002-12-31 |
| 6492279 | Plasma etching methods | David S. Becker, Bradley J. Howard | 2002-12-10 |
| 6485572 | Use of pulsed grounding source in a plasma reactor | Chuck E. Hedberg | 2002-11-26 |
| 6479388 | Methods of forming materials over uneven surface topologies, and methods of forming insulative materials over and between conductive lines | Werner Juengling | 2002-11-12 |
| 6475814 | Method for improved low pressure inductively coupled high density plasma reactor | Guy T. Blalock | 2002-11-05 |
| 6475920 | Plasma etching method using low ionization potential gas | John W. Coburn | 2002-11-05 |
| 6451705 | Self-aligned PECVD etch mask | Shane J. Trapp | 2002-09-17 |
| 6414376 | Method and apparatus for reducing isolation stress in integrated circuits | Randhir P. S. Thakur, Zhiqiang Wu, Alan R. Reinberg | 2002-07-02 |
| 6413358 | Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks | — | 2002-07-02 |
| 6402886 | Use of a chemically active reticle carrier for photomask etching | Richard L. Stocks | 2002-06-11 |
| 6387816 | Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor | Guy T. Blalock | 2002-05-14 |
| 6383334 | Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor | Guy T. Blalock | 2002-05-07 |
| 6374871 | Liner for use in processing chamber | — | 2002-04-23 |
| 6356500 | Reduced power DRAM device and method | Eugene H. Cloud, Kie Y. Ahn, Leonard Forbes, Paul A. Farrar, Alan R. Reinberg +3 more | 2002-03-12 |
| 6342165 | Method of forming high aspect ratio apertures | David S. Becker | 2002-01-29 |