Issued Patents 2002
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6476435 | Self-aligned recessed container cell capacitor | Michael A. Walker | 2002-11-05 |
| 6458015 | Chemical-mechanical planarization machine and method for uniformly planarizing semiconductor wafers | Chris C. Yu | 2002-10-01 |
| 6455916 | Integrated circuit devices containing isolated dielectric material | — | 2002-09-24 |
| 6444537 | Method of preparing a capacitor on integrated circuit device containing isolated dielectric material | — | 2002-09-03 |
| 6431960 | Fixed abrasive polishing pad | Michael A. Walker | 2002-08-13 |
| 6425815 | Fixed abrasive polishing pad | Michael A. Walker | 2002-07-30 |
| 6419568 | Fixed abrasive polishing pad | Michael A. Walker | 2002-07-16 |
| 6414275 | Method and apparatus for performing thermal reflow operations under high gravity conditions | David L. Chapek | 2002-07-02 |
| 6409936 | Composition and method of formation and use therefor in chemical-mechanical polishing | Whonchee Lee | 2002-06-25 |
| 6409577 | Method for conditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers | — | 2002-06-25 |
| 6409581 | Belt polishing pad method | Michael A. Walker | 2002-06-25 |
| 6409586 | Fixed abrasive polishing pad | Michael A. Walker | 2002-06-25 |
| 6402884 | Planarizing solutions, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies | Scott Meikle | 2002-06-11 |
| 6386951 | Methods of polishing materials, methods of slowing a rate of material removal of a polishing process, and methods of forming trench isolation regions | Michael A. Walker | 2002-05-14 |
| 6386212 | Method of cleaning mixed material surfaces | — | 2002-05-14 |
| 6380086 | High-speed planarizing apparatus for chemical-mechanical planarization of semiconductor wafers | Hugh E. Stroupe | 2002-04-30 |
| 6379225 | Planarization process with abrasive polishing slurry that is selective to a planarized surface | Guy F. Hudson, Scott Meikle | 2002-04-30 |
| 6361417 | Method and apparatus for supporting a polishing pad during chemical-mechanical planarization of microelectronic substrates | Michael A. Walker | 2002-03-26 |