Issued Patents 2002
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6486953 | Accurate real-time landing angle and telecentricity measurement in lithographic systems | John G. Hartley, James D. Rockrohr, Maris A. Sturans | 2002-11-26 |
| 6483117 | Symmetric blanking for high stability in electron beam exposure systems | Clay S. Clement, Rodney A. Kendall, Werner Stickel | 2002-11-19 |
| 6476400 | Method of adjusting a lithography system to enhance image quality | Christopher F. Robinson, Scott A. Messick | 2002-11-05 |
| 6456019 | Real time measurement of leakage current in high voltage electron guns | Samuel K. Doran | 2002-09-24 |
| 6437352 | Charged particle beam projection lithography with variable beam shaping | — | 2002-08-20 |
| 6429607 | Constant power dynamic focus coil | Maris A. Sturans | 2002-08-06 |
| 6414313 | Multiple numerical aperture electron beam projection lithography system | Rodney A. Kendall, David J. Pinckney | 2002-07-02 |
| 6353231 | Pinhole detector for electron intensity distribution | Steven D. Golladay, Rodney A. Kendall, Carl E. Bohnenkamp | 2002-03-05 |