Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6498091 | Method of using a barrier sputter reactor to remove an underlying barrier layer | Ling Chen, Seshadri Ganguli, Wei Cao | 2002-12-24 |
| 6455421 | Plasma treatment of tantalum nitride compound films formed by chemical vapor deposition | Toshio Itoh, Michael Yang | 2002-09-24 |
| 6358323 | Method and apparatus for improved control of process and purge material in a substrate processing system | John V. Schmitt, Frank Chang, Xin Guo, Ling Chen | 2002-03-19 |