Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5695910 | Resist composition for deep ultraviolet light | Takanori Yasuda, Akiko Katsuyama, Kazuhiro Yamashita | 1997-12-09 |
| 5677112 | Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition | Keiji Oono, Hiroshi Matsuda, Masayuki Endo, Satoshi Kobayashi | 1997-10-14 |
| 5670299 | Pattern formation process | Hirotoshi Fujie, Keiji Oono, Takaaki Negishi | 1997-09-23 |
| 5627006 | Resist material | Keiji Oono, Hirotoshi Fujie | 1997-05-06 |