Issued Patents 1997
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5702861 | Positive photoresist composition | Satoshi Niikura, Takako Suzuki, Kousuke Doi, Hidekatsu Kohara | 1997-12-30 |
| 5702862 | Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone | Hayato Ohno, Taku Nakao, Hisanobu Harada, Shinichi Hidesaka, Hidekatsu Kohara | 1997-12-30 |
| 5662961 | Method for forming a protective coating film on electronic parts and devices | Katsuya Tanitsu, Atsushi Kawakami, Hatsuyuki Tanaka | 1997-09-02 |
| 5631314 | Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition | Kazumasa Wakiya, Masakazu Kobayashi | 1997-05-20 |
| 5614271 | Method for the formation of a silica-based coating film | Tatsuhiko Shibuya, Susumu Okano, Hideya Kobari, Yoshio Hagiwara | 1997-03-25 |
| 5614251 | Method and liquid coating composition for the formation of silica-based coating film on substrate surface | Yoshinori Sakamoto, Yoshio Hagiwara, Hatsuyuki Tanaka | 1997-03-25 |
| 5604077 | Positive-working photoresist composition comprising a novolac resin made in butyrolactone as a solvent | Shinichi Kono, Hayato Ohno, Hidekatsu Kohara | 1997-02-18 |
| 5601961 | High-sensitivity positive-working photoresist composition | Kazuhiko Nakayama, Taku Nakao, Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara | 1997-02-11 |
| 5599653 | Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer | Taku Nakao, Hiroyuki Yamazaki, Nobuo Tokutake, Masato Saito, Hidekatsu Kohara | 1997-02-04 |