Issued Patents 1997
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5601961 | High-sensitivity positive-working photoresist composition | Kazuhiko Nakayama, Taku Nakao, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 1997-02-11 |
| 5599653 | Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer | Taku Nakao, Hiroyuki Yamazaki, Masato Saito, Hidekatsu Kohara, Toshimasa Nakayama | 1997-02-04 |