Issued Patents 1997
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5702861 | Positive photoresist composition | Satoshi Niikura, Takako Suzuki, Kousuke Doi, Toshimasa Nakayama | 1997-12-30 |
| 5702862 | Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone | Hayato Ohno, Taku Nakao, Hisanobu Harada, Shinichi Hidesaka, Toshimasa Nakayama | 1997-12-30 |
| 5604077 | Positive-working photoresist composition comprising a novolac resin made in butyrolactone as a solvent | Shinichi Kono, Hayato Ohno, Toshimasa Nakayama | 1997-02-18 |
| 5601961 | High-sensitivity positive-working photoresist composition | Kazuhiko Nakayama, Taku Nakao, Kousuke Doi, Nobuo Tokutake, Toshimasa Nakayama | 1997-02-11 |
| 5599653 | Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer | Taku Nakao, Hiroyuki Yamazaki, Nobuo Tokutake, Masato Saito, Toshimasa Nakayama | 1997-02-04 |