Issued Patents 1997
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5702862 | Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone | Hayato Ohno, Hisanobu Harada, Shinichi Hidesaka, Hidekatsu Kohara, Toshimasa Nakayama | 1997-12-30 |
| 5601961 | High-sensitivity positive-working photoresist composition | Kazuhiko Nakayama, Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1997-02-11 |
| 5599653 | Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer | Hiroyuki Yamazaki, Nobuo Tokutake, Masato Saito, Hidekatsu Kohara, Toshimasa Nakayama | 1997-02-04 |