Issued Patents 1997
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5691111 | Photosensitive resin composition useful as resist for deep UV lithography containing sulfonium salts | Kaichiro Nakano, Etsuo Hasegawa | 1997-11-25 |
| 5635332 | Alkylsulfonium salts and photoresist compositions containing the same | Kaichiro Nakano, Katsumi Maeda, Etsuo Hasegawa | 1997-06-03 |
| 5621019 | Monomer having vinyl group, polymer thereof and photosensitive resin including those | Kaichiro Nakano, Etsuo Hasegawa | 1997-04-15 |