Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5691111 | Photosensitive resin composition useful as resist for deep UV lithography containing sulfonium salts | Shigeyuki Iwasa, Etsuo Hasegawa | 1997-11-25 |
| 5665518 | Photoresist and monomer and polymer for composing the photoresist | Katsumi Maeda, Takeshi Ohfuji, Etsuo Hasegawa | 1997-09-09 |
| 5635332 | Alkylsulfonium salts and photoresist compositions containing the same | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 1997-06-03 |
| 5621019 | Monomer having vinyl group, polymer thereof and photosensitive resin including those | Shigeyuki Iwasa, Etsuo Hasegawa | 1997-04-15 |