Issued Patents 1997
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5691111 | Photosensitive resin composition useful as resist for deep UV lithography containing sulfonium salts | Shigeyuki Iwasa, Kaichiro Nakano | 1997-11-25 |
| 5674576 | Liquid crystalline optical device operable at a low drive voltage | Tomohisa Gotoh, Taisaku Nakata, Hideya Murai | 1997-10-07 |
| 5669439 | Laminated type heat exchanger | Masatoshi Sudo, Toshiya Nagasawa, Keiichi Yoshii | 1997-09-23 |
| 5665518 | Photoresist and monomer and polymer for composing the photoresist | Katsumi Maeda, Kaichiro Nakano, Takeshi Ohfuji | 1997-09-09 |
| 5653283 | Laminated type heat exchanger | Keiichi Yoshii, Toshiya Nagasawa, Masatoshi Sudo | 1997-08-05 |
| 5635332 | Alkylsulfonium salts and photoresist compositions containing the same | Kaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa | 1997-06-03 |
| 5621019 | Monomer having vinyl group, polymer thereof and photosensitive resin including those | Kaichiro Nakano, Shigeyuki Iwasa | 1997-04-15 |