KM

Katsumi Maeda

NE Nec: 2 patents #67 of 1,182Top 6%
Overall (1997): #34,168 of 185,788Top 20%
2
Patents 1997

Issued Patents 1997

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
5665518 Photoresist and monomer and polymer for composing the photoresist Kaichiro Nakano, Takeshi Ohfuji, Etsuo Hasegawa 1997-09-09
5635332 Alkylsulfonium salts and photoresist compositions containing the same Kaichiro Nakano, Shigeyuki Iwasa, Etsuo Hasegawa 1997-06-03