Issued Patents 1989
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4844832 | Containing an arylsulfonic acid, a phenol and a naphalenic solvent | Masakazu Kobayashi, Shingo Asaumi, Akira Yokota | 1989-07-04 |
| 4833067 | Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant | Hatsuyuki Tanaka, Hidekatsu Kohara, Yoshiyuki Sato, Shingo Asaumi, Toshimasa Nakayama +1 more | 1989-05-23 |
| 4797348 | Method of forming a positive resist pattern in photoresist of o-naphthoquinone diazide and bisazide with UV imaging exposure and far UV overall exposure | Yoichi Nakamura, Shirushi Yamamoto, Takashi Komine, Akira Yokota | 1989-01-10 |