Issued Patents 1989
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4882260 | Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye | Nobuo Tokutake, Masanori Miyabe, Toshimasa Nakayama, Shingo Asaumi, Hatsuyuki Tanaka +1 more | 1989-11-21 |
| 4873177 | Method for forming a resist pattern on a substrate surface and a scum-remover therefor | Hatsuyuki Tanaka, Yoshiyuki Sato, Toshimasa Nakayama | 1989-10-10 |
| 4833067 | Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant | Hatsuyuki Tanaka, Yoshiyuki Sato, Shingo Asaumi, Toshimasa Nakayama, Akira Yokota +1 more | 1989-05-23 |
| 4820621 | Developer solution for positive-working photoresist compositions comprising a base and a non-ionic surfactant | Hatsuyuki Tanka, Yoshiyuki Sato, Toshimasa Nakayama | 1989-04-11 |
| 4804612 | Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation | Shingo Asaumi, Hatsuyuki Tanaka, Toshimasa Nakayama | 1989-02-14 |