Issued Patents 1989
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4873177 | Method for forming a resist pattern on a substrate surface and a scum-remover therefor | Hatsuyuki Tanaka, Hidekatsu Kohara, Toshimasa Nakayama | 1989-10-10 |
| 4833067 | Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant | Hatsuyuki Tanaka, Hidekatsu Kohara, Shingo Asaumi, Toshimasa Nakayama, Akira Yokota +1 more | 1989-05-23 |
| 4820621 | Developer solution for positive-working photoresist compositions comprising a base and a non-ionic surfactant | Hatsuyuki Tanka, Hidekatsu Kohara, Toshimasa Nakayama | 1989-04-11 |