Issued Patents 1989
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4882260 | Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye | Hidekatsu Kohara, Nobuo Tokutake, Masanori Miyabe, Toshimasa Nakayama, Hatsuyuki Tanaka +1 more | 1989-11-21 |
| 4844832 | Containing an arylsulfonic acid, a phenol and a naphalenic solvent | Masakazu Kobayashi, Akira Yokota, Hisashi Nakane | 1989-07-04 |
| 4833067 | Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant | Hatsuyuki Tanaka, Hidekatsu Kohara, Yoshiyuki Sato, Toshimasa Nakayama, Akira Yokota +1 more | 1989-05-23 |
| 4824762 | Method for rinse treatment of a substrate | Masakazu Kobayashi, Hatsuyuki Tanaka | 1989-04-25 |
| 4804612 | Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation | Hidekatsu Kohara, Hatsuyuki Tanaka, Toshimasa Nakayama | 1989-02-14 |