Issued Patents 1989
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4797348 | Method of forming a positive resist pattern in photoresist of o-naphthoquinone diazide and bisazide with UV imaging exposure and far UV overall exposure | Yoichi Nakamura, Shirushi Yamamoto, Akira Yokota, Hisashi Nakane | 1989-01-10 |