Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8303087 | Package structure of inkjet-printhead chip | — | 2012-11-06 |
| 7954924 | Package method of inkjet-printhead chip and its structure | — | 2011-06-07 |
| 6921629 | Self-aligned fabrication process for a nozzle plate of an inkjet print head | Yi HUANG | 2005-07-26 |
| 6773094 | Method of using photolithography and etching for forming a nozzle plate of an inkjet print head | Ming-Hsun Yang, Arnold Chang-Mou Yang, Guey-Chyuan Chen, Chih-Chieh Hsu | 2004-08-10 |
| 6569760 | Method to prevent poison via | Hua-Tai Lin | 2003-05-27 |
| 6479401 | Method of forming a dual-layer anti-reflective coating | Mai-Ru Kuo | 2002-11-12 |
| 6348707 | Method of manufacturing semiconductor capacitor | — | 2002-02-19 |
| 6303431 | Method of fabricating bit lines | — | 2001-10-16 |
| 6300240 | Method for forming bottom anti-reflective coating (BARC) | Mai-Ru Kuo, Shin-Pu Jeng, Chunshing Chen | 2001-10-09 |
| 6287957 | Self-aligned contact process | — | 2001-09-11 |
| 6263586 | Device and method for planarizing a thin film | — | 2001-07-24 |
| 6180483 | Structure and fabrication method for multiple crown capacitor | — | 2001-01-30 |
| 6165909 | Method for fabricating capacitor | — | 2000-12-26 |
| 6136646 | Method for manufacturing DRAM capacitor | Wan-Yih Lien | 2000-10-24 |
| 6133085 | Method for making a DRAM capacitor using a rotated photolithography mask | — | 2000-10-17 |
| 6121082 | Method of fabricating DRAM with novel landing pad process | Mai-Ru Kuo | 2000-09-19 |
| 6110837 | Method for forming a hard mask of half critical dimension | Bor-Wen Chan | 2000-08-29 |
| 6100577 | Contact process using Y-contact etching | — | 2000-08-08 |
| 6096653 | Method for fabricating conducting lines with a high topography height | Yeur-Luen Tu | 2000-08-01 |
| 6037217 | Method of fabricating a capacitor electrode structure in a dynamic random-access memory device | — | 2000-03-14 |
| 6033966 | Method for making an 8-shaped storage node DRAM cell | — | 2000-03-07 |
| 6022776 | Method of using silicon oxynitride to improve fabricating of DRAM contacts and landing pads | Wan-Yih Lien, Meng-Jaw Cherng | 2000-02-08 |
| 5950104 | Contact process using Y-contact etching | — | 1999-09-07 |
| 5924000 | Method for forming residue free patterned polysilicon layer containing integrated circuit structures | — | 1999-07-13 |
| 5902133 | Method of forming a narrow polysilicon gate with i-line lithography | — | 1999-05-11 |