Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6727166 | Removal of silicon oxynitride material using a wet chemical process after gate etch processing | Edward Yeh | 2004-04-27 |
| 6326283 | Trench-diffusion corner rounding in a shallow-trench (STI) process | Victor Chiang Liang, Mark Rubin | 2001-12-04 |
| 6319796 | Manufacture of an integrated circuit isolation structure | Ramiro Solis, Hunter B. Brugge, Michela S. Love, Bijan Moslehi, Milind Weling | 2001-11-20 |
| 5920787 | Soft edge induced local oxidation of silicon | Jake Haskell, Jie Zheng | 1999-07-06 |
| 5811346 | Silicon corner rounding in shallow trench isolation process | Harlan Lee Sur, Jr., Dipankar Pramanik | 1998-09-22 |
| 5702978 | Sloped silicon nitride etch for smoother field oxide edge | Calvin T. Gabriel | 1997-12-30 |