Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6727166 | Removal of silicon oxynitride material using a wet chemical process after gate etch processing | Olivier Laparra | 2004-04-27 |
| 6342428 | Method for a consistent shallow trench etch profile | Tammy Zheng, Calvin T. Gabriel | 2002-01-29 |
| 6207565 | Integrated process for ashing resist and treating silicon after masked spacer etch | Calvin T. Gabriel, Samit Sengupta | 2001-03-27 |
| 6130166 | Alternative plasma chemistry for enhanced photoresist removal | — | 2000-10-10 |