SK

Seigo Kishino

VA Vlsi Technology Research Association: 3 patents #3 of 70Top 5%
HP Hyogo Prefecture: 1 patents #3 of 25Top 15%
JS Japan Society For The Promotion Of Science: 1 patents #5 of 13Top 40%
Overall (All Time): #1,260,279 of 4,157,543Top 35%
4
Patents All Time

Issued Patents All Time

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
7126194 Method for removing impurities of a semiconductor wafer, semiconductor wafer assembly, and semiconductor device Hideki Tsuya 2006-10-24
4378269 Method of manufacturing a single crystal silicon rod Yoshiaki Matsushita, Shinichiro Takasu 1983-03-29
4376657 Method of making fault-free surface zone in semiconductor devices by step-wise heat treating Kazutoshi Nagasawa, Yoshiaki Matsushita, Masaru Kanamori 1983-03-15
4314595 Method of forming nondefective zone in silicon single crystal wafer by two stage-heat treatment Kazuhiko Yamamoto, Yoshiaki Matsushita, Masaru Kanamori, Kazutoshi Nagasawa, Naotsugu Yoshihiro 1982-02-09