| 12354503 |
Signage fastener |
John Richard Muse |
2025-07-08 |
|
| 11756805 |
Apparatus and method for die stack flux removal |
Kenji Nulman, Jonathan Fijal, Phillip N. Tyler, Ian Rafter |
2023-09-12 |
$10,792,000 |
| 11342215 |
Semiconductor wafer processing chamber |
William Gilbert Breingan, Chris Hofmeister, Lev Rapoport |
2022-05-24 |
$8,589,000 |
| 11232958 |
System and method for self-cleaning wet treatment process |
Kenji Nulman, Mark Yannuzzi, Phillip N. Tyler, Jonathan Fijal, William Gilbert Breingan +6 more |
2022-01-25 |
$9,904,000 |
| 11069583 |
Apparatus and method for the minimization of undercut during a UBM etch process |
David Goldberg, Elena Lawrence, Ian Cochran, Christopher Orlando, James Swallow +1 more |
2021-07-20 |
$9,616,000 |
| 11004755 |
Apparatus and method for the minimization of undercut during a UBM etch process |
David Goldberg, Elena Lawrence, Ian Cochran, Christopher Orlando, James Swallow |
2021-05-11 |
$11,539,000 |
| 10707099 |
Collection chamber apparatus to separate multiple fluids during the semiconductor wafer processing cycle |
William Gilbert Breingan, Chris Hofmeister |
2020-07-07 |
$10,204,000 |
| 10559488 |
Two-level tape frame rinse assembly |
William Gilbert Breingan, James Swallow |
2020-02-11 |
|
| 10553502 |
Two etch method for achieving a wafer thickness profile |
Laura Mauer, John Clark, Elena Lawrence, Eric Kurt Zwirnmann, David Goldberg +1 more |
2020-02-04 |
|
| 10541180 |
Apparatus and method for wafer thinning in advanced packaging applications |
Laura Mauer, John Clark, Kenji Nulman |
2020-01-21 |
|
| 10503182 |
Apparatus and method for metals free reduction and control of resistivity of deionized water |
Jonathan Yutkowitz |
2019-12-10 |
|
| 10446387 |
Apparatus and method to control etch rate through adaptive spiking of chemistry |
Laura Mauer, James Swallow, David Goldberg, Eric Kurt Zwirnmann |
2019-10-15 |
|
| 10443943 |
Apparatus and method to control properties of fluid discharge via refrigerative exhaust |
Laura Mauer, George Chiaverini, Jia Li |
2019-10-15 |
|
| 10413850 |
Apparatus and method to remove solids from material lift off post process solvents |
Paul Vit, Kenji Nulman, Jim Anders |
2019-09-17 |
|
| 10294132 |
Apparatus and method to reduce and control resistivity of deionized water |
Jonathan Yutkowitz |
2019-05-21 |
|
| 10239031 |
Apparatus and method for mixing fluids with degradational properties |
John Clark, Mark Yannuzzi, Laura Mauer, Paul Vit |
2019-03-26 |
|
| 10026660 |
Method of etching the back of a wafer to expose TSVs |
Laura Mauer, John Clark, Elena Lawrence, Eric Kurt Zwirnmann, David Goldberg +1 more |
2018-07-17 |
|
| 9698062 |
System and method for performing a wet etching process |
Laura Mauer, Elena Lawrence, Ramey Youssef |
2017-07-04 |
|
| 9694436 |
System and method for flux coat, reflow and clean |
William Gilbert Breingan, Lev Rapoport, John Clark, Laura Mauer |
2017-07-04 |
|
| 9541837 |
Apparatus and method for removing challenging polymer films and structures from semiconductor wafers |
Laura Mauer, Ramey Youssef, John Clark, Elena Lawrence |
2017-01-10 |
|
| 9333446 |
Apparatus and method to remove undissolved solids from post process dry film strip solvents |
Laura Mauer, John Clark, Lev Rapoport |
2016-05-10 |
|